ZEISS Semiconductor Manufacturing Technology​

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Enabler for smaller, more powerful, and more energy-efficient microchips​

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Working for tomorrow today. ​

Around 80 percent of all microchips worldwide are produced using ZEISS technologies. As the centerpiece of every electronically controlled system, they have become an integral part of our everyday lives – whether in smartphones, smart homes or smart factories. ZEISS is a technology leader in the field of semiconductor manufacturing equipment. With high-precision lithography optics, photomask systems and process control solutions, ZEISS enables the production of ever smaller, increasingly powerful, and more energy-efficient microchips, and thus plays a pivotal role in the age of micro- and nanoelectronics.

You will be part of an interdisciplinary team of experts for the development of repair processes of lithographic masks for semiconductor industry. The corresponding repair processes of our MeRiT product family are based on gas assisted electron beam induced processing (FEBIP). In FEBIP suitable gases are dosed onto and adsorbed on the mask surface will be locally dissociated by the impact of a focused electron beam eventually leading to deposition or etching, i.e., additive respective subtractive processing of the mask. Your task will be to develop/adapt a simulation software for FEBIP to support and improve our repair processes. You will perform corresponding FEBIP/repair experiments to evaluate the accuracy of the simulation and to determine urgently needed parameters for the simulation package. The goal is to develop the FEBIP simulation into a powerful tool to learn about and advance our repair processes.

Your activity includes:

Responsible for the development of a capable FEBIP simulation

Plan, organize and carry out development work independently

Systematic documentation and archiving of research and development work

Document, prepare, report and present work progress

Support with customer inquiries

A degree in natural sciences or engineering e.g. physics, chemistry, materials science, ideally with a doctorate

Experience in simulating complex surface reactions, ideally the simulation of FEBIP processes

Ideally a background in “Surface Science” with chemical processes on surfaces, and/or gas-assisted electron beam lithography

Ideally experience with high-resolution microscopic and spectroscopic or spectromicroscopic methods

Good knowledge of spoken and written English

Your ZEISS Recruiting Team: